Publication:
Properties of ultrathin oxynitride films grown on Si0.74Ge0.26/Si heterolayers using low energy plasma source nitrogen implantation (2005)
Author(s): Mahapatra R; Maikap S; Kar GS; Ray SK
- Journal: Solid-State Electronics
- Volume: 49
- Issue: 3
- Pages: 449–452
- Publisher: Pergamon
- Publication type: Article
- Bibliographic status: Published