High performance strained Si/SiGe n-channel MOSFETs: impact of alloy composition and layer architecture (2003)

Author(s): Kwa KSK; Olsen SH; Driscoll LS; O'Neill AG; Chattopadhyay S

      • Date: 16-18 September 2003
      • Conference Name: International Conference on Solid State Devices and Materials (SSDM)
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

        Dr Kelvin Kwa
        Research Associate

        Professor Anthony O'Neill
        Siemens Professor of Microelectronics

        Dr Sarah Olsen
        Senior Lecturer