Newcastle University

Publication

Optimization of the channel lateral strain profile for improved performance of multi-gate MOSFETs (2009)

Author(s): De Michielis L, Moselund K, Bouvet D, Dobrosz P, Olsen S, O'Neill A, Lattanzio L, Najmzadeh M, Selmi L, Ionescu A

• Conference Name: International Symposium on VLSI Technology, Systems, and Applications, Proceedings
• Pages: 119-120
• Publisher: IEEE
• Publication type: Conference Proceedings (inc. abstract)
• Bibliographic status: Published

• URL: http://dx.doi.org/10.1109/VTSA.2009.5159319
• DOI: 10.1109/VTSA.2009.5159319

Staff

Professor Anthony O'Neill Siemens Professor of Microelectronics	Email: anthony.oneill@ncl.ac.uk Telephone: +44 (0) 191 222 7328
Dr Sarah Olsen Senior Lecturer	Email: sarah.olsen@ncl.ac.uk Telephone: +44 (0) 191 222 855 2