Publication

Measurement of the residual macro and microstrain in strained Si/SiGe using Raman spectroscopy (2004)

Author(s): Dobrosz P, Bull SJ, Olsen SH, O'Neill AG

      • Date: 13-15 April 2004
      • Conference Name: High-Mobility Group IV Materials and Devices
      • Volume: 809
      • Pages: 109-114
      • Publisher: Materials Research Society
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

        Keywords: SILICON MOSFETS STRESS DEVICE

        Staff

        Professor Anthony O'Neill
        Siemens Professor of Microelectronics

        Dr Sarah Olsen
        Senior Lecturer