Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ (2005)

Author(s): Hamilton JJ, Collart EJH, Colombeau B, Bersani M, Giubertoni D, Sharp JA, Cowern NEB, Kirkby KJ

      • Journal: Materials Science and Engineering B
      • Volume: 124-125
      • Pages: 215-219
      • Publisher: Elsevier SA
      • Publication type: Article
      • Bibliographic status: Published