Publication

Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth (2005)

Author(s): Pawlak BJ, Vandervorst W, Smith AJ, Cowern NEB, Colombeau B, Pages X

      • Date: 04-03-2005
      • Journal: Applied Physics Letters
      • Volume: 86
      • Issue: 10
      • Pages: 101913
      • Publisher: American Institute of Physics
      • Publication type: Article
      • Bibliographic status: Published
      Staff

      Professor Nick Cowern
      Professor of Nanoscience / Nanotechnology