Publication

Evaluation of strained Si/SiGe material for high performance CMOS (2004)

Author(s): Olsen SH; O'Neill AG; Chattopadhyay S; Kwa KSK; Driscoll LS; Norris DJ; Cullis AG; Robbins DJ; Zhang J

      • Journal: Semiconductor Science and Technology
      • Volume: 19
      • Issue: 6
      • Pages: 707-714
      • Publisher: Institute of Physics Publishing Ltd.
      • Publication type: Article
      • Bibliographic status: Published
      Staff

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer