Publication

Technique for measuring the residual strain in strained Si/SiGe MOSFET structures using Raman spectroscopy (2004)

Author(s): Dobrosz P; Bull SJ; Olsen SH; O'Neill AG

      • Conference Name: 4th European Symposium on NanoMechanical Testing
      • Volume: 95
      • Pages: 340-344
      • Publisher: Zeitschrift fuer Metallkunde
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published
        Staff

        Professor Anthony O'Neill
        Siemens Professor of Microelectronics

        Dr Sarah Olsen
        Senior Lecturer