Publication

Characterization of thermally oxidized Ti/SiO2 gate dielectric stacks on 4H-SiC substrate (2006)

Author(s): Mahapatra R, Poolamai N, Chattopadhyay S, Wright NG, Chakraborty AK, Coleman KS, Coleman PG, Burrows CP

    Notes: Article no. 072910 3 pages

      • Journal: Applied Physics Letters
      • Volume: 88
      • Issue: 7
      • Pages: 072910
      • Publisher: American Institute of Physics
      • Publication type: Article
      • Bibliographic status: Published