Publication

Doubling speed using strained Si/SiGe CMOS technology (2005)

Author(s): Olsen SH; Temple M; O'Neill AG; Paul DJ; Chattopadhyay S; Kwa KSK; Driscoll LS

      • Conference Name: Fourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)
      • Volume: 508, issues 1-2
      • Pages: 338-341
      • Publisher: Thin Solid Films: Elsevier
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published
      Staff

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer