Structural pattern formation in titanium-nickel contacts on silicon carbide following high-temperature annealing (2006)

Author(s): Nikitina IP, Vassilevski KV, Horsfall AB, Wright NG, O'Neill AG, Johnson CM, Yamamoto T, Malhan RK

      • Journal: Semiconductor Science and Technology
      • Volume: 21
      • Issue: 7
      • Pages: 898-905
      • Publisher: Institute of Physics Publishing Ltd.
      • Publication type: Article
      • Bibliographic status: Published

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Konstantin Vasilevskiy
      Senior Research Associate