Publication

Study of surface roughness and dislocation generation in strained Si layers grown on thin strain-relaxed buffers for high performance MOSFETs (2006)

Author(s): Escobedo-Cousin E; Olsen SH; Bull SJ; O'Neill AG; Coulson H; Claeys C; Loo R; Delhougne R; Caymax M

      • Conference Name: Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest
      • Pages: 1-2
      • Publisher: IEEE Press
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published
      Staff

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer