Publication

Nanometer strain profiling through Si/SiGe quantum layers (2008)

Author(s): Agaiby RMB, Olsen SH, Dobrosz P, Coulson H, Bull SJ, O'Neill AG

      • Journal: Journal of Applied Physics
      • Volume: 104
      • Issue: 1
      • Pages: 013507
      • Publisher: American Institute of Physics
      • Publication type: Article
      • Bibliographic status: Published
      Staff

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer