Publication

Strained Si/SiGe MOS technology: improving gate dielectric integrity (2007)

Author(s): Olsen SH, Yan L, Agaiby R, Escobedo-Cousin E, O'Neill AG

      • Date: 26-28 September 2007
      • Conference Name: International Symposium on Advanced Gate Stack Technology (ISAGST)
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Unknown
        Staff

        Professor Anthony O'Neill
        Siemens Professor of Microelectronics

        Dr Sarah Olsen
        Senior Lecturer