Publication

Diffusion of ion-implanted boron and silicon in germanium (2004)

Author(s): Uppal S, Willoughby AFW, Bonar JM, Cowern NEB, Morris RJH, Dowsett MG

      • Date: 12-16 April 2004
      • Conference Name: Materials Science Forum: Materials Research Society Spring Meeting
      • Volume: 809
      • Pages: 237-242
      • Publisher: Trans Tech Publications Ltd.
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published
        Staff

        Professor Nick Cowern
        Professor of Nanoscience / Nanotechnology