Publication

Effective edge termination design in SiCVJFET (2005)

Author(s): Bhatnagar P; Wright NG; Vassilevski KV; O'Neill AG; Horsfall AB; Johnson CM

      • Date: 31 August - 4 September 2004
      • Conference Name: Silicon Carbide and Related Materials: 5th European Conference on Silicon Carbide and Related Materials
      • Volume: 483
      • Pages: 877-880
      • Publisher: Trans Tech Publications Ltd.
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

      Keywords: TCAD optimisation Vertical Junction Field Effect Transistor Junction Termination Extension edge termination SCHOTTKY DIODES GUARD-RING

      Staff

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Konstantin Vasilevskiy
      Senior Research Associate

      Professor Nick Wright
      Pro-Vice-Chancellor