Doping and mobility profiles in defect-engineered ultra-shallow junctions: Bulk and SOI (2004)

Author(s): Smith AJ, Colombeau B, Gwilliam R, Collart EJH, Cowern NEB, Sealy BJ

      • Date: 13-15 April 2004
      • Conference Name: Silicon Front-End Junction Formation-Physics and Technology
      • Volume: 810
      • Pages: 109-114
      • Publisher: Materials Research Society
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published