Publication

Optimization of fluorine co-implantation for PMOS source and drain extension formation for 65nm technology node (2004)

Author(s): Cowern NEB; Graoui H; Hilkene M; McComb B; Castle M; Felch S; Al-Bayati A; Tjandra A; Foad MA

      • Date: 13-15 April 2004
      • Conference Name: Silicon Front-End Junction Formation-Physics and Technology
      • Volume: 810
      • Pages: 247-252
      • Publisher: Materials Research Society
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published
        Staff

        Professor Nick Cowern
        Professor of Nanoscience / Nanotechnology