Reactive ion etching of silicon carbide with patterned boron implantation (2004)

Author(s): Vassilevski KV, Hedley J, Horsfall AB, Johnson CM, Wright NG

      • Conference Name: 10th International Conference on Silicon Carbide and Related Materials (ICSCRM 2003)
      • Volume: 457-460
      • Pages: 925-928
      • Publisher: Materials Science Forum: Trans Tech Publications Ltd
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

      Dr John Hedley
      Senior Lecturer