A study of SiGe/Si n-MOSFET processed and unprocessed channel layers using FIB and TEM methods (2005)

Author(s): Chang ACK, Norris DJ, Ross IM, Cullis AG, Olsen SH, O'Neill AG

      • Date: 11-14 April 2005
      • Conference Name: Proceedings of the 14th Conference on Microscopy of Semiconducting Materials (MSM)
      • Volume: 107
      • Pages: 111-114
      • Publisher: Springer
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer