Nanoscale strain characterisation for ultimate CMOS and beyond (2008)

Author(s): Olsen SH, Dobrosz P, Agaiby RMB, Tsang YL, Alatise O, Bull SJ, O'Neill AG, Moselund KE, Ionescu AM, Majhi P, Buca D, Mantl S, Coulson H

    Notes: Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS Invited presentation

      • Date: 26-30 May 2008
      • Conference Name: E-MRS 2008 Spring Meeting
      • Volume: 11, issues 5-6
      • Pages: 271-278
      • Publisher: Materials Science in Semiconductor Processing: Pergamon
      • Publication type: Conference Proceedings (inc. abstract)
      • Bibliographic status: Published

      Keywords: Characterisation Nanoscale Nanowire Raman spectroscopy Resolution Silicon Silicon-germanium Strain Strained silicon-on-insulator


      Professor Anthony O'Neill
      Siemens Professor of Microelectronics

      Dr Sarah Olsen
      Senior Lecturer