Publication:

Nanoscale strain characterisation for ultimate CMOS and beyond (2008)

Author(s): Olsen S, Dobrosz P, Agaiby R, Tsang Y, Alatise O, Bull S, O'Neill A, Moselund K, Ionescu A, Majhi P, Buca D, Mantl S, Coulson H

    Notes: E-MRS 2008 Spring Conference Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS

      • Journal: Materials Science in Semiconductor Processing
      • Volume: 11
      • Issue: 5
      • Pages: 271-278
      • Publisher: Pergamon
      • Publication type: Article
      • Bibliographic status: Published