Publication:

Energy-band alignment of HfO2/SiO2/SiC gate dielectric stack (2008)

Author(s): Mahapatra R, Chakraborty AK, Horsfall AB, Wright NG, Beamson G, Coleman KS

    Notes: Article no. 042904 3 pages

      • Journal: Applied Physics Letters
      • Volume: 92
      • Issue: 4
      • Pages: 042904
      • Publisher: American Institute of Physics
      • Publication type: Article
      • Bibliographic status: Published
      Staff

      Dr Alton Horsfall
      Reader in Semiconductor Technology

      Professor Nick Wright
      Pro-Vice-Chancellor