Staff Profile

Dr Enrique Escobedo-Cousin

Research Associate



I was born and raised in Mexico City. My background is in Electrical & Electronic Engineering, having done my first degree at the National Autonomous University of Mexico (UNAM). I specialised in microsystems engineering and signal processing, and graguated with a thesis on noise reduction for infra-red astronomical images following a one year research placement at the Astronomy Institute. Shortly after graduating in 2003, i moved to Newcastle to study an MSc in Microelectronics and continued with a PhD in Semiconductor Technology,  graduating in 2008.

My research interests include epitaxial graphene and strained silicon/silicon-germanium technologies for electronic device applications. My areas of expertise are semiconductor micro and nano characterisation techniques using Raman spectroscopy, atomic force microscopy (AFM), Raman-AFM integration, XPS, electrical analysis and micro-fabrication work in clean room environment. I am at home with all three phases of electronic device production: design, fabrication and characterisation, as well as data analysis and presentation.

Currently i work in a joint project between the Institute of Neuroscience and the group of Emeging Technology and Materials (EEE) which aims to implement a multi-contact electromyography sensor for cross-sectional imaging of skeletal muscle.


2004 - 2008: PhD Semiconductor Technology. Newcastle University. Thesis: Material characterisation of strained Si/SiGe MOSFETs

2003 - 2004: MSc Microelectronics. Newcastle University. Thesis: Impact of virtual substrate Ge composition on the series resistance of strained Si/SiGe MOSFETs

1996 - 2001: BSc Electrical & Electronic Engineering. Universidad Nacional Autónoma de México (UNAM). Thesis: Image noise reduction for an infra-red camera/spectro 


Spanish, English, German, French (basic), Russian (basic).

Informal interests

Swing dance instructor


Research Interests

Design, fabrication and characterisation of electronic materials and devices, development of nanoscale physical analysis techniques. Extensive experience using atomic force microscopy (AFM), Raman spectroscopy, X-ray photo-spectroscopy (XPS) and electrical I-V, C-V and Hall measurements. Characterisation of semiconductor properties using micro-electromechanical systems based structures. Work in clean room environment: photolithography, film deposition by e-beam evaporation and sputtering, chemical etching and thermal process.


2010 - 2011: EEE8103/EEE8019 Semiconductor Device Fabrication