I was born and raised in Mexico City. My background is in Electrical & Electronic Engineering, having done my first degree at the National Autonomous University of Mexico (UNAM). I specialised in microsystems engineering and signal processing, and graguated with a thesis on noise reduction for infra-red astronomical images following a one year research placement at the Astronomy Institute. Shortly after graduating in 2003, i moved to Newcastle to study an MSc in Microelectronics and continued with a PhD in Semiconductor Technology, graduating in 2008.
My research interests include epitaxial graphene and strained silicon/silicon-germanium technologies for electronic device applications. My areas of expertise are semiconductor micro and nano characterisation techniques using Raman spectroscopy, atomic force microscopy (AFM), Raman-AFM integration, XPS, electrical analysis and micro-fabrication work in clean room environment. I am at home with all three phases of electronic device production: design, fabrication and characterisation, as well as data analysis and presentation.
Currently i work in a joint project between the Institute of Neuroscience and the group of Emeging Technology and Materials (EEE) which aims to implement a multi-contact electromyography sensor for cross-sectional imaging of skeletal muscle.
2004 - 2008: PhD Semiconductor Technology. Newcastle University. Thesis: Material characterisation of strained Si/SiGe MOSFETs
2003 - 2004: MSc Microelectronics. Newcastle University. Thesis: Impact of virtual substrate Ge composition on the series resistance of strained Si/SiGe MOSFETs
1996 - 2001: BSc Electrical & Electronic Engineering. Universidad Nacional Autónoma de México (UNAM). Thesis: Image noise reduction for an infra-red camera/spectro
Spanish, English, German, French (basic), Russian (basic).
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Design, fabrication and characterisation of electronic materials and devices, development of nanoscale physical analysis techniques. Extensive experience using atomic force microscopy (AFM), Raman spectroscopy, X-ray photo-spectroscopy (XPS) and electrical I-V, C-V and Hall measurements. Characterisation of semiconductor properties using micro-electromechanical systems based structures. Work in clean room environment: photolithography, film deposition by e-beam evaporation and sputtering, chemical etching and thermal process.
2010 - 2011: EEE8103/EEE8019 Semiconductor Device Fabrication