I was born and raised in Mexico City. I lived there until i concluded a five year long first degree in Electrical and Electronic Engineering at the National Autonomous University of Mexico (UNAM). There i had the opportunity to write my thesis under the supervision of Dr Elfego Ruiz-Schneider and Dr Francisco García Ugalde, following a one year research placement at the Astronomy Institute. Short after graduating in 2003, i moved to Newcastle to study the MSc in Microelectronics and continued with a PhD with Si/SiGe group the following year, finally graduating in 2008. Both during my PhD and my initial postdoctoral research i have worked alongside Dr Sarah Olsen and Prof Anthony O'Neill. My current research interests involve the growth and characterisation of epitaxiala graphene for electronic device applications.
Responsible for the operation and maintenance of the AFM/Raman laboratory.
PhD Semiconductors Technology from Newcastle University, UK (2004 – 2008). Thesis: Material characterisation of strained Si/SiGe MOSFETs
MSc Microelectronics from Newcastle University, UK (2003 – 2004). Dissertation: Impact of virtual substrate Ge composition on the series resistance of strained Si/SiGe MOSFETs
BSc Electrical & Electronic Engineering from Universidad Nacional Autónoma de México (UNAM), Mexico (1996 – 2001). Thesis: Image noise reduction for an infra-red camera/spectrograph
Spanish, English, German, French (beginner), Russian (beginner).
I drink coffee and read a lot (both things). When not at work, i can often be found reading away in some cafe in town. I am also a guitarist and have an interest for roots, folk and blues music. Other interests include stragegy games such as Magic the Gathering and chess and swing dancing.
Design, fabrication and characterisation of electronic materials and devices, development of nanoscale physical analysis techniques. Extensive experience using atomic force microscopy (AFM), Raman spectroscopy, X-ray photo-spectroscopy (XPS) and electrical I-V, C-V and Hall measurements. Characterisation of semiconductor properties using micro-electromechanical systems based structures. Work in clean room environment: photolithography, film deposition by e-beam evaporation and sputtering, chemical etching and thermal process. Areas of expertise: graphene and strained silicon technologies for electronic devices.
2010 - 2011: EEE8103/EEE8019 Semiconductor Device Fabrication